This book addresses electromigration failure modes in electronics
covering both theory and experiments. It reviews both silicon and
GaAs technologies. Various rate controlling details are summarized
including an investigation of temperature dependence. The book
concludes with a discussion of the current status and future plans
for electromigration resistant advanced metallization systems for
VLSI.
ISBN: 0-471-58489-4
John Wiley & Sons Inc.
605 Third Avenue
New York, NY 10158-0012
Order Toll Free: 800-879-4539